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1973; Aspnes, 1976) are particular cases of expressions (86). B. Formulas for Estimating Angles of Polarization $ and A by Experimentally Measured Values In this section we shall derive the formulas for calculating the angles of polarization when using both the null and photometric measuring techniques, proceeding from the general expressions for the operating light beam intensity at the output of the ellipsometer. 1 . Null Techniques for Determining the Angles of Polarization In order to utilize null techniques for determining the angles of polarization, it is necessary to have an ellipsometer assembled in ACSP sequence (Fig.

Df = d o d,. Here m is the integer and d , < d o . In this connection we consider the results presented by Semenenko et al. (1978) to be of great interest. From this work one can see that at least in some cases the range of unambiguous determination of the film parameters can be substantially extended when changing from a quasi-monochromatic light beam to the operating light beam of a sizable spectral width. Figure 18 shows what occurs in this case. It should be noted that one of the important applications of ellipsometry is the measurement of the thickness of superthin dielectric films (d < 50 A) on semiconductor and metal substrates.

The expressions for the relative reflectivity coefficient given in the present section can be used directly to carry out the numerical computations of the value of p for quite a number of concrete problems. C. Analysis of the Situation :Horizons for Further Investigations At first sight the foregoing calculation procedure seems to be quite complete. But in reality, the case is somewhat different. First of all, Abeles’s matrices permit calculation of the reflectivities for a plane monochromatic wave.

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